Advanced Energy Industries. has filed a patent for bias supplies and plasma processing systems. The invention involves a bias supply with specific components and a controller to apply periodic voltage efficiently. The system aims to enhance plasma processing performance. GlobalData’s report on Advanced Energy Industries gives a 360-degree view of the company including its patenting strategy. Buy the report here.

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According to GlobalData’s company profile on Advanced Energy Industries, Smart grids was a key innovation area identified from patents. Advanced Energy Industries's grant share as of January 2024 was 46%. Grant share is based on the ratio of number of grants to total number of patents.

Bias supply for plasma processing systems with periodic voltage application

Source: United States Patent and Trademark Office (USPTO). Credit: Advanced Energy Industries Inc

The patent application (Publication Number: US20240030001A1) describes a bias supply system that applies a periodic voltage using a specific configuration. The system includes an output node, a return node, a switch, and multiple inductors connected in a particular arrangement. A controller is utilized to control the application of the periodic voltage between the output node and the return node by regulating the switch's operation. The periodic voltage is applied by closing the switch for a precise duration to allow the current to complete a full cycle from zero to a peak value, back to zero, and then to a peak value in the opposite direction before returning to zero.

This innovative bias supply system's design allows for the precise application of periodic voltage between nodes, offering potential advantages in various applications requiring controlled voltage supply. The use of inductors, switches, and a controller in the described configuration enables efficient regulation of the voltage output. By ensuring the current completes a full cycle within a specific timeframe, the system can provide stable and controlled voltage levels between the output and return nodes. This patent application showcases a novel approach to bias supply systems, highlighting the importance of precise voltage control in electronic devices and systems.

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GlobalData Patent Analytics tracks bibliographic data, legal events data, point in time patent ownerships, and backward and forward citations from global patenting offices. Textual analysis and official patent classifications are used to group patents into key thematic areas and link them to specific companies across the world’s largest industries.