Advanced Energy Industries has patented a system for calibrating sensors in a match network used for tuning power delivery to a plasma processing chamber. The method involves self-calibration of sensors in isolation and mutual calibration to enhance tuning accuracy. GlobalData’s report on Advanced Energy Industries gives a 360-degree view of the company including its patenting strategy. Buy the report here.
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According to GlobalData’s company profile on Advanced Energy Industries, Smart grids was a key innovation area identified from patents. Advanced Energy Industries's grant share as of March 2024 was 48%. Grant share is based on the ratio of number of grants to total number of patents.
Calibrating sensors for power delivery to plasma processing chamber
A recently granted patent (Publication Number: US11961712B2) discloses a match network designed for impedance matching a radio frequency power generator to a plasma processing chamber. The match network includes sensors, a memory storing calibration matrices, and a controller to monitor power delivery to the chamber. The calibration matrices, K1 and K2, along with a modified second calibration matrix, K2', are utilized to calibrate data from the sensors, accounting for errors between them. The modified second calibration matrix, K2', specifically addresses errors between the sensors during mutual calibration by measuring current and voltage at the output and plasma return input with a mutual load coupled between the sensors.
Furthermore, the patent details the process of calibrating the sensors individually against self-loads to obtain the calibration matrices, K1 and K2, and then mutually calibrating them against each other. The modified calibration matrices, K1' and K2', are derived to correct errors between the sensors after individual calibration. The calibration matrices are determined based on complex impedance values, and the mutual load used during calibration is configured to provide a complex impedance matching a reference load. The patent emphasizes the importance of accurate calibration in ensuring efficient power delivery to the plasma processing chamber, highlighting the innovative approach of accounting for errors between sensors during calibration to enhance overall system performance.
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GlobalData Patent Analytics tracks bibliographic data, legal events data, point in time patent ownerships, and backward and forward citations from global patenting offices. Textual analysis and official patent classifications are used to group patents into key thematic areas and link them to specific companies across the world’s largest industries.
