Nissin Electric has patented a plasma control system with a high-frequency power supply, antenna group, reactance variable elements, current detection mechanism, uniformity calculation unit, and reactance changing unit. The system adjusts reactances to achieve a predetermined uniformity index value in the current flowing through antennas. GlobalData’s report on Nissin Electric gives a 360-degree view of the company including its patenting strategy. Buy the report here.
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According to GlobalData’s company profile on Nissin Electric, was a key innovation area identified from patents. Nissin Electric's grant share as of February 2024 was 36%. Grant share is based on the ratio of number of grants to total number of patents.
Plasma control system with uniform current distribution in antennas
A recently granted patent (Publication Number: US11862431B2) discloses a plasma control system designed to enhance the uniformity of plasma in various applications. The system comprises a high-frequency power supply, an antenna group with multiple antennas connected to the power supply, reactance variable elements connected to the antennas, a current detection mechanism, a uniformity calculation unit, and a reactance changing unit. The system operates by adjusting the reactances of the variable elements in a specific sequence to optimize the uniformity index value of the current flowing through the antennas towards a predetermined set value.
Furthermore, the patent details the configuration of the antenna group, the placement of reactance variable elements, and the role of the current detection mechanism in monitoring the current flow through the antennas. The system's reactance changing unit is programmed to compare the uniformity index value with a threshold value and adjust the reactance change amount accordingly. Additionally, a weighted value storage unit is included to prioritize reactance adjustments based on the influence on the uniformity index value. The patent also covers a plasma control program that enables a computer to function as a uniformity calculation unit and a reactance changing unit within the plasma control system, facilitating efficient control and optimization of plasma uniformity in various industrial processes.
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GlobalData Patent Analytics tracks bibliographic data, legal events data, point in time patent ownerships, and backward and forward citations from global patenting offices. Textual analysis and official patent classifications are used to group patents into key thematic areas and link them to specific companies across the world’s largest industries.
